S P E A R: Analytical Chamber |
Chamber components:
PHI Electronics Duoplasmatron Ion Gun: The Duoplasmatron Ion Source and Analog Ion Beam Column are capable of producing either Oxygen, Argon or Xenon ions with a maximum accelerating voltage of 10 kV. The gun has a minimum probe size of <5 microns at the surface, which when coupled with a secondary electron detector, is able to generate useful Secondary Electron Microscopy (SEM) images during sputtering (Graphic Intensive).
PHI Electronics Dual-Anode Xray Source: The Dual-Anode X-ray Source can produce either Al K-alpha or Mg K-alpha x-rays with a maximum power output of 400 watts. It is typically used with the Spherical Capacitance Analyzer for acquiring X-ray Photoelectron Spectroscopy (XPS) data. FEI Thermally Assisted Schottky Field Emission Electron Gun: The Schottky Field Emission Electron Gun (SE) is a high brightness electron source. Its primary advantage, compared to other field emission sources, is its ability to operating at relatively high pressures. It has a maximum accelerating voltage of 15 kV under its current configuration with a beam current of 12 to 200 nanoamps. The SE's small probe size, on the order of 50 nm, allows Auger Electron Spectroscopy to be acquired with a high degree of spatial resolution, illustrated in preliminary data (Graphic Intensive).
PHI Electronics Spherical Electron Energy Analyzer: The Spherical Capacitance Analyzer is an electron energy analyzer able to acquire either XPS or AES spectrum. It has sufficient resoluotion to detector eV shifts due to surface chemical bonding. It also has a selectable aperature ranging from 2mm X 10 mm to 70 microns X 70 microns. See also Demonstrations of what the system can do. (Graphic Intensive)
| ||||